EPOCH | Mysite

EPOCH PROJECT

With the development of AI technology, AI surveillance society has arrived. Excessive surveillance threatens the privacy of people living in modern times. In this project, we adversarially trained an AI model to generate specific patterns inducing AI to misrecognize, then created a camouflage garment using the pattern. We seek an alternative camouflage for the 21st century and aim to reconsider the relationship between the latest technology and our well-beings (in the AI surveillance society.)

SECOND EPOCH

The second prototype “UNLABELED” was demonstrated at the Media Ambition Tokyo 2020 in Tokyo, in February 28th-March 8th, 2020. For an update, the pattern arrangement on the 3D simulation was aligned. Consequently, the accuracy of the system was improved.

Credit

Concept

Creative Director: Nao Tokui

Creative Director: Naoki Tanaka

Develop

Technical Direction: Makoto Amano

Design Direction: Hanako Hirata

Engineering / Machine Learning: Ryosuke Nakajima

Design Assistant: Yuka Sai

Technical Support: Yusuke Yamada

Garment Design: Shun Matsunaga

Video

Model: Kayou Shin

Cinematography: Kei Gochi

Creative

Planner: Risako Kawashima

Exhibition Producer: Ryo Miura

Producer: Masafumi Fujioka

Producer: Ryotaro Omori

Production Manager: Kohei Suzuki

Film Director: Shuto Hashiura

Cinematographer: Yudai Maruyama

Music: Reo Anzai

Stylist: Kumiko Sannomaru

Fashion Director: Takuya Chiba

Special Thanks

3D scan model: Kaya Ryu

Printing facility: andmade

3D scan facility: 株式会社映像伝播社

FIRST EPOCH

For the first prototype, we created a top with a repeated pattern in a tile, based on previous research of Adversarial Examples. Applying AdaIn Style Transfer, we succeeded to control the pattern, allowing more freedom in garment design. Presented at SFC Open Research Forum in November, 2019.